The 35th North American Conference on Molecular Beam Epitaxy (NAMBE 2019) will be held in Ketchum, Idaho, on September 22-25, 2019. NAMBE is an international forum for Molecular Beam Epitaxy (MBE) technology and MBE grown materials and devices. MBE is a ultra-high vacuum thin-film deposition technique. It enables the production of photonic devices, solar cells, and thermoelectrics.
Conference topics include MBE growth modifications, fundamentals of MBE growth, MBE technology, e.g. in-situ monitoring, and materials characterization.
Among the participants is k-Space Associates, a worldwide supplier of thin-film metrology tools, such as the k-Space Integrated Control for Epitaxy system (ICE), a modular in-situ metrology tool designed for MBE reactors.
Abstracts need to be submitted by April 19, 2019.
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